JFET公司
功勋
电容
电气工程
MOSFET
平面的
物理
光电子学
击穿电压
晶体管
场效应晶体管
电压
材料科学
拓扑(电路)
电极
计算机科学
工程类
计算机图形学(图像)
量子力学
作者
Jun Wang,J. Korec,Shuming Xu
标识
DOI:10.1109/apec.2012.6165811
摘要
A novel planar gate double-diffused MOS (DMOS) transistor is proposed for low voltage (<;10V) DC/DC converter and load switch applications. The novel MOSFET includes a heavily doped sinker layer in the JFET region and a field plate structure on the surface of the LDD region. The LDD region is fully depleted at a small drain bias, and the field plate acts as a shield electrode significantly reducing the gate to drain capacitance. The proposed MOSFET with a rating breakdown voltage of 12 V and a maximum gate voltage of 8 V demonstrates a specific on-resistance of 5.8 mΩ·mm 2 and a gate to drain charge of 0.4 nC/mm 2 at a gate voltage of 4.5 V. The corresponding figure of merit (FOM= R ON, sp ·Q gd, sp ) of the power MOSFET is 2.3 mΩ·nC, which is record low in the published literature.
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