中间层
绝缘体上的硅
材料科学
通过硅通孔
光电子学
硅
薄脆饼
倒装芯片
硅光子学
光子学
互连
三维集成电路
光互连
电子线路
集成电路
电气工程
计算机科学
工程类
电信
纳米技术
蚀刻(微加工)
胶粘剂
图层(电子)
作者
Do-Won Kim,Hong Yu Li,K. W. Chang,Woon Leng Loh,Ser Choong Chong,Hong Cai,Batara Surya
标识
DOI:10.1109/ectc.2018.00129
摘要
In this study, 3D electronic-photonic integrated circuits (EPIC) packaging using through silicon vias (TSV) has been demonstrated. Silicon photonic integrated circuit (Si-PIC) in SOI which has TSV for electrical interconnection is flip-chip bonded on a Si interposer using electrochemical plating (ECP) bumps of 90 μm-diameter in this 3D EPIC packaging. A 750 Ω-cm of high-resistivity SOI and silicon wafers are used for PIC chip with TSV and interposer respectively. Measured insertion loss (S21) for the 3D EPIC packaged test vehicle using TSV is less than 3.5dB and return loss (S11) is less than -13dB up to 50 GHz. This high-bandwidth 3D EPIC packaging platform can be applied for the system-on-packaging (SOP) modules and subsystems such as optical transceiver (TRx) and radioover-fiber (ROF) solutions.
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