Elastic emission polishing based on shear thickening slurry
泥浆
抛光
材料科学
复合材料
增稠
膨胀的
剪切(地质)
化学机械平面化
高分子科学
作者
Lianmin Yin,Yifan Dai,Hao Hu,Chaoliang Guan
标识
DOI:10.1117/12.2604939
摘要
Elastic emission polishing (EEM) has excellent polishing surface quality, and shear thickening can improve polishing removal efficiency. This paper mainly studies the effect of shear thickening slurry on EEM. Firstly, the polishing device and removal mechanism based on shear thickening are introduced. Then a single-point contrast polishing experiment was carried out. It is found that the shear thickening slurry can improve the removal efficiency of ordinary EEM, the former is about 2.7 times that of the latter.