Monoclinic tungsten trioxide (WO3) thin films using spraying pyrolysis: electrical, structural and stoichiometric ratio at different molarity

Chemical spraying pyrolysis technique has used to deposit tungsten oxide on glass substrates with varied concentrations ranging from 50 to 90 mM at the optimum deposition temperature of 350 ͦ C. All films exhibit a monoclinic phase, with highest structural properties at a molar concentration of 80 mM. Miller's plain at (200) was found to be the most dominant in all films. The film has a fibrous network with an increasing diameter with increasing concentration, according to FE-SEM. The EDX revealed that the ratio of W/O at the optimum concentration (80mM) was 2.62, with a stoichiometric of 68.6%. The rate of grain size grew with concentration, whereas the rate of roughness reduced with concentration, according to atomic force microscopy investigations of thin films. The mean electrical conductivity increased gradually with concentration up to 4.176 x10-8 S/cm-1 and subsequently declined to 4.542x 10-10 S/cm-1 , while the activation energy climbed gradually with concentration up to reach 0.298eV before decreasing significantly