光刻
计算机科学
工程制图
材料科学
纳米技术
工程类
作者
Di Zhang,Zhuo Li,Shaoyong Lu,Dong Li,Zhuo Chen,Yanzhao Li,Xinguo Li,Xiaoguang Xu
摘要
In this work, efficient QD‐photosensitive ligand system were designed. By direct photolithography, RGB pixel arrays with a single sub‐pixel size of 39 um × 5 um were successfully prepared on patterned PM substrates. While illuminated separately, there were no residual QD emission peaks from neighbor sub‐pixel in electroluminescence spectra. Experience on the PM substrate guided the successful preparation of a 4.7‐inch 650 ppi AM‐QLED display. This was the first AM‐QLED prototype prepared by direct lithography.
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