邻接
单层
外延
材料科学
光电子学
光伏
氮化硼
六方氮化硼
纳米技术
单晶
数码产品
结晶学
石墨烯
化学
光伏系统
物理化学
生物
有机化学
图层(电子)
生态学
作者
Li Wang,Xiaozhi Xu,Leining Zhang,Ruixi Qiao,Muhong Wu,Zhichang Wang,Shuai Zhang,Jing Liang,Zhihong Zhang,Yuwei Shan,Yi Guo,Marc‐Georg Willinger,Hui Wu,Qunyang Li,Wenlong Wang,Peng Gao,Shiwei Wu,Ying Jiang,Dapeng Yu,Enge Wang
出处
期刊:Cornell University - arXiv
日期:2018-01-01
被引量:2
标识
DOI:10.48550/arxiv.1811.06688
摘要
Atom-layered hexagonal boron nitride (hBN), with excellent stability, flat surface and large bandgap, has been reported to be the best 2D insulator to open up the great possibilities for exciting potential applications in electronics, optoelectronics and photovoltaics. The ability to grow high-quality large single crystals of hBN is at the heart for those applications, but the size of single-crystal 2D BN is less than a millimetre till now. Here, we report the first epitaxial growth of a 10*10 cm2 single-crystal hBN monolayer on a low symmetry Cu(110) "vicinal surface". The growth kinetics, unidirectional alignment and seamless stitching of hBN domains are unambiguously illustrated using centimetre- to the atomic-scale characterization techniques. The findings in this work are expected to significantly boost the massive applications of 2D materials-based devices, and also pave the way for the epitaxial growth of broad non-centrosymmetric 2D materials.
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