材料科学
纳米线
纳米晶
正交晶系
纳米技术
化学气相沉积
纳米结构
电阻式触摸屏
光电子学
化学工程
结晶学
晶体结构
电气工程
化学
工程类
作者
Fionán Davitt,Hugh G. Manning,Fred Robinson,Samantha L. Hawken,Subhajit Biswas,Nikolay Petkov,Maart van Druenen,John J. Boland,Gillian Reid,Justin D. Holmes
标识
DOI:10.1002/admi.202000474
摘要
Abstract Here the controlled growth of SnSe nanowires by a liquid injection chemical vapor deposition (CVD) method employing a distorted octahedral [SnCl 4 { n BuSe(CH 2 ) 3 Se n Bu}] single‐source diselenoether precursor is reported. CVD with this single‐source precursor allows morphological and compositional control of the SnSe x nanostructures formed, including the transformation of SnSe 2 nanoflakes into SnSe nanowires and again to SnSe nanoflakes with increasing growth temperature. Significantly, highly crystalline SnSe nanowires with an orthorhombic Pnma 62 crystal structure can be controllably synthesized in two growth directions, either <011> or <100>. The ability to tune the growth direction of SnSe will have important implications for devices constructed using these nanocrystals. The SnSe nanowires with a <011> growth direction display a reversible polarity‐dependent memory switching ability, not previously reported for nanoscale SnSe. A resistive switching on/off ratio of 10 3 without the use of a current compliance limit is seen, illustrating the potential use of SnSe nanowires for low‐power nonvolatile memory applications.
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