光刻胶
污染
材料科学
氨
热脱附
傅里叶变换红外光谱
抵抗
热稳定性
解吸
质谱法
化学工程
分析化学(期刊)
纳米技术
环境化学
化学
有机化学
色谱法
吸附
生态学
图层(电子)
工程类
生物
作者
Kim Dean,Daniel A. Miller,Ronald A. Carpio,John S. Petersen,Georgia K. Rich
出处
期刊:Journal of Photopolymer Science and Technology
[The Technical Association of Photopolymers, Japan]
日期:1997-01-01
卷期号:10 (3): 425-443
被引量:12
标识
DOI:10.2494/photopolymer.10.425
摘要
This paper will report post-exposure delay results using Shipley UVIBISTM deep UV resist. The variables of the experiments include: processing delays (expose to post-exposure-bake and coat to exposure), different levels of ammonia, different substrates, and processing conditions. Better delay stability is observed when standing waves are reduced by processing. When standing waves are present, scumming tends to occur at the nodes; acid depletion near the nodal region prevents adequate deprotection for development to occur.The methods for detecting airborne contamination are ion mobility spectrometry for ammonia and thermal desorption gas chromatography for 1-methyl-2-pyrrolidone (NMP). Fourier transfer infrared (FFIR) spectroscopy is used to monitor the deprotection reaction of UVIIHS photoresist films with and without delays.
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