单层
材料科学
硅烷化
双层
硅烷
椭圆偏振法
磁滞
化学工程
图层(电子)
接触角
自组装
硅
分析化学(期刊)
薄膜
纳米技术
化学
复合材料
光电子学
有机化学
膜
生物化学
量子力学
物理
工程类
作者
A. K. Chauhan,D. K. Aswal,S. P. Koiry,S. K. Gupta,J. V. Yakhmi,Christoph Sürgers,David Guérin,S. Lenfant,D. Vuillaume
标识
DOI:10.1007/s00339-007-4336-7
摘要
We report the deposition of 3-aminopropyltrimethoxysilane (APTMS) multilayers on SiOx/Si(p++) substrates by a layer-by-layer self-assembly process. The multilayers were grafted in a glove box having nitrogen ambient with both humidity and oxygen contents <1 ppm using APTMS solutions prepared in an anhydrous toluene. Deposition of the multilayers has been carried out as a function of solution concentration and grafting time. Characterization of the multilayers using static de-ionized water contact angle, ellipsometry, X-rayphotoelectron spectroscopy and atomic force microscope measurements revealed that self-assembling of the multilayers takes place in two distinct stages: (i) the first APTMS monolayer chemisorbs on a hydroxylated oxide surface by a silanization process and, (ii) the surface amino group of the first monolayer chemisorbs the hydrolyzed silane group of other APTMS molecules present in the solution, leading to the formation of a bilayer. The second stage is a self-replicating process that results in the layer-by-layer self-assembly of the multilayers with trapped NH3
+ ions. The current–voltage characteristics of the multilayers exhibit a hysteresis effect along with a negative differential resistance, suggesting their potential application in the molecular memory devices. A possible mechanism for the observed hysteresis effect based on filling and de-filling of the NH3
+ acting as traps is presented.
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