Native point defects and carbon clusters in 4H-SiC: A hybrid functional study

材料科学 晶体缺陷 间质缺损 碳化硅 碳纤维 费米能级 格子(音乐) 碳化物 化学物理 分子物理学 凝聚态物理 结晶学 光电子学 兴奋剂 电子 化学 冶金 物理 复合数 量子力学 复合材料 声学
作者
Takuma Kobayashi,Kou Harada,Yu Kumagai,Fumiyasu Oba,Yu-ichiro Matsushita
出处
期刊:Journal of Applied Physics [American Institute of Physics]
卷期号:125 (12) 被引量:22
标识
DOI:10.1063/1.5089174
摘要

We report first-principles calculations that clarify the formation energies and charge transition levels of native point defects and carbon clusters in the 4H polytype of silicon carbide (4H-SiC) under a carbon-rich condition. We applied a hybrid functional that reproduces the experimental bandgap of SiC well and offers reliable defect properties. For point defects, we investigated single vacancies, antisites, and interstitials of Si and C on relevant sites. For carbon clusters, we systematically introduced two additional C atoms into the perfect 4H-SiC lattice with and without removing Si atoms and performed structural optimization to identify stable defect configurations. We found that neutral Si antisites are energetically favorable among Si-point defects in a wide range of the Fermi level position around the intrinsic regime, whereas negatively-charged Si vacancies and a positively-charged Si interstitial on a site surrounded by six Si and four C atoms become favorable under n- and p-type conditions, respectively. For C-point defects, neutral C antisites are favorable under intrinsic and n-type conditions, whereas positively-charged C vacancies become favorable under p-type conditions. We also found that a di-carbon antisite is more favorable than a C-split interstitial, which is the most stable form of single C interstitials.
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