钙钛矿(结构)
硅
钝化
晶体硅
材料科学
串联
光电子学
氧化物
冶金
纳米技术
复合材料
化学
结晶学
图层(电子)
作者
Zhiqin Ying,Zhenhai Yang,Jingming Zheng,Wei He,Li Chen,Chuanxiao Xiao,Jingsong Sun,Chunhui Shou,Ganghua Qin,Jiang Sheng,Yuheng Zeng,Baojie Yan,Xi Yang,Jichun Ye
出处
期刊:Joule
[Elsevier]
日期:2022-11-01
卷期号:6 (11): 2644-2661
被引量:45
标识
DOI:10.1016/j.joule.2022.09.006
摘要
Perovskite/silicon tandems offer a promising pathway to increase the efficiency beyond the Auger limit of silicon at minimal additional cost. However, it is challenging to accommodate the solution-processed perovskite without flattening or reducing pyramidal texture of silicon subcells. Herein, we report the first monolithic perovskite/silicon tandem featuring an industrially applicable front-side-nanostructured black silicon with a tunnel oxide passivated contact (TOPCon). The TOPCon together with the surface reconstruction of black silicon contributes to the high-level surface passivation without sacrificing the broadband light trapping. Additionally, the reconstructed nanotexture significantly facilitates the wetting of perovskite and acts as a nanoconfining scaffold to guide the vertical growth of perovskite. The resulting tandem yields a certified efficiency of 28.2%, representing one of the highest efficiencies reported on either perovskite/TOPCon or double-side-textured perovskite/silicon tandems.
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