六甲基二硅氧烷
材料科学
压痕硬度
等离子体增强化学气相沉积
聚碳酸酯
磨损(机械)
复合材料
化学气相沉积
图层(电子)
刮擦
化学工程
微观结构
纳米技术
等离子体
物理
量子力学
工程类
作者
Anastasia S. Bil,Sergey Alexandrov,А. Д. Бреки,A. L. Shakhmin,Anastasiya Speshilova
标识
DOI:10.1002/ppap.202300085
摘要
Abstract This work is the first systematic study of the microhardness, scratch resistance, and abrasion resistance of protective silica‐like layers deposited on polycarbonate by atmospheric pressure plasma‐enhanced chemical vapor deposition (AP PECVD) from tetraethoxysilane (TEOS) and hexamethyldisiloxane (HMDSO). The influence of the layer composition on the abovementioned mechanical properties was considered in detail. It has been found that the films deposited from HMDSO at 110°C are characterized by a microhardness value that is almost three times higher than that of the films deposited from TEOS under similar conditions. The lower carbon content and, most likely, the partial substitution of oxygen in the SiO 2 matrix with carbon, leading to the formation of an oxycarbide structure, are responsible for the improved mechanical properties of the films deposited from HMDSO.
科研通智能强力驱动
Strongly Powered by AbleSci AI