高功率脉冲磁控溅射
材料科学
铟
镓
光电子学
锌
透射率
电阻率和电导率
透明导电膜
电子工程
溅射沉积
纳米技术
电气工程
溅射
薄膜
冶金
工程类
作者
Y. Chao,Yang‐Ming Lu,Shenghui Chen
标识
DOI:10.1364/iprsn.2023.jtu4a.34
摘要
HiPIMS was utilized to produce Indium-Gallium-Zinc-Oxide (IGZO) films and evaluate their IR transmittance, resistivity, carrier mobility, and carrier concentration at various HiPIMS duty cycles and oxygen flux, in order to determine the optimal process parameters.
科研通智能强力驱动
Strongly Powered by AbleSci AI