光刻
计算机科学
临界尺寸
覆盖
小学生
光学(聚焦)
焦点深度(构造)
光学
职位(财务)
过程(计算)
计量学
维数(图论)
物理
数学
生物
操作系统
财务
构造学
古生物学
经济
俯冲
程序设计语言
纯数学
作者
Siyu Zhu,Zhiyuan Niu,Fang Zhang,Xiaozhe Ma,Zongshun Zeng,Weilin Cheng,Weijie Shi,Huijie Huang
出处
期刊:Optik
[Elsevier]
日期:2020-04-01
卷期号:208: 164072-164072
被引量:1
标识
DOI:10.1016/j.ijleo.2019.164072
摘要
Abstract The off-axis illumination (OAI) technology is one of the resolution enhancement technologies, and it used to reduce critical dimension (CD) and increase depth of focus (DOF) which are the important performance parameters of photolithography machine. The performance of illumination modes has great effect on critical dimension uniformity (CDU), H–V bias and overlay accuracy. In order that the pupil characteristic parameters can always meet the requirements for a long time using, it is necessary to adopt the pupil correction technology for photolithography illumination system. Using experiments and photolithography performance simulation, a programmable pupil correction method based on correction fingers is studied. The correction algorithm and its operation process are analyzed in detail. The experimental results show that the energy distribution of corrected pupils is more balanced than the uncorrected ones. Furthermore, the simulation results indicate that the corrected pupil could improve the exposure patterns in different aspects. The proposed method could determine the fingers’ position easily, and could directly reflect the pupil performance requirements.
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