Tribological performance of maintenance-free Cu-Sn-Ni-MoS2 composites over a wide temperature range

Purpose The purpose of this paper is to investigate the friction and wear mechanisms in copper-based self-lubricating composites with MoS 2 as the lubricating phase, which provides a theoretical basis for subsequent research on high-performance copper-based self-lubricating materials. Design/methodology/approach Friction tests were performed at a speed of 100 r/min, a load of 10 N, a friction radius of 5 mm and a sliding speed of 30 min. Friction experiments were carried out at RT-500°C. The phase composition of the samples was characterized by X-ray diffraction of Cu Ka radiation, and the microstructure, morphology and elemental distribution were characterized by scanning electron microscopy and energy dispersive spectroscopy. Reactants and valences formed during the wear process were analyzed by X-ray photoelectron spectroscopy. Findings The addition of MoS 2 can effectively improve friction-reducing and anti-wear action of the matrix, which is beneficial to form a lubricating film on the sliding track. After analyzing different changing mechanism of the sliding tracks, the oxides and sulfides of MoS 2 , MoO 2 , Cu 2 O, CuO and Ni(OH) 2 were detected to form a synergetic lubricating film on the sliding track, which is responsible for the excellent tribological properties from room to elevated temperature. Research limitations/implications For self-lubrication Cu–Sn–Ni–MoS 2 material in engineering field, there are still few available references on high-temperature application. Practical implications This paper provides a theoretical basis for the following research on copper-based self-lubricating materials with high performance. Originality/value With this statement, the authors hereby certify that the manuscript is the results of their own effort and ability. They have indicated all quotes, citations and references. Furthermore, the authors have not submitted any essay, paper or thesis with similar content elsewhere. No conflict of interest exits in the submission of this manuscript.