激进的
过氧化氢
臭氧
化学
光解
光化学
紫外线
羟基自由基
产量(工程)
摩尔吸收率
紫外线辐射
高级氧化法
水处理
环境化学
有机化学
环境工程
环境科学
催化作用
放射化学
材料科学
光学
物理
光电子学
冶金
作者
William H. Glaze,Joon‐Wun Kang,Douglas H. Chapin
标识
DOI:10.1080/01919518708552148
摘要
Abstract Advanced oxidation processes are defined as those which involve the generation of hydroxyl radicals in sufficient quantity to affect water purification. The theoretical and (practical yield of OH from O3 at high pH, 03/H202, O3/UV and H2O2/UV systems is reviewed. New data is presented which illustrates the importance of direct photolysis in the O3/UV process, the effect of the H202:03 ratio in the O3/H2O2 process, and the impact of the low extinction coefficient of H2O2 in the H202/UV process.
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