Handbook for cleaning for semiconductor manufacturing

Surface and colloidal chemicals aspects relevant to wet chemical cleaning and drying of semiconductor surfaces are reviewed. Specific areas discussed in this chapter include sur- face charging of metal oxide and nitride films, development of an electrical double layer, zeta potential of electrified interfaces and its effect on particulate contamination, adsorp- tion of surfactants and metal ions on insulating surfaces, principles of surface tension gra- dient drying, and wetting and penetration of high aspect ratio features.