丝网印刷
材料科学
防反射涂料
金属化
共发射极
镉
冶金
复合材料
涂层
光电子学
图层(电子)
作者
Seong Je Jeon,Sang Man Koo,Seon Am Hwang
标识
DOI:10.1016/j.solmat.2009.01.003
摘要
Screen-printed n+–p–p+ solar cells were fabricated on Cz single crystalline Si material, with a 45 Ω/sq emitter and PECVD SiNx antireflective coating with a thickness of 700 Å, using different Ag pastes and commercial leaded reference paste (CN33-462, Ferro Corp.). Ag and Al contacts were co-fired using a mass-production line equipped with mesh belt conveyer furnace systems (Centrotherm thermal solution GmbH & Co. KG). The average results for single crystalline Si solar cells (156 cm2) are: Isc=5.043 A, Voc=0.621 V, Rs=0.0087 Ω, Rsh=15.3 Ω, FF=0.773, and Eff=16.45%. Rsh and fill factor values of fabricated cells were slightly higher when compared with the commercial leaded Ag paste, although cells were fabricated by metallizing the lead-free silver pastes. For the lead-free Ag paste used in this study, the line pattern continuity is retained with improved edge definition in sharp contrast to that of reference Ag paste. Average value of Rs was also equivalent approximately to that of the leaded Ag paste.
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