双极结晶体管
共发射极
材料科学
绝缘体上的硅
光电子学
异质发射极双极晶体管
多晶硅耗尽效应
晶体管
电气工程
电压
硅
栅氧化层
工程类
作者
Jianan Wei,Sheng Qiu,Jing Fu,Xiaojun Fu,Qing Liu,Xiaolei Zhang,Ting Luo,Tao Su,Ke Zhu,Lei Huang,Tingwei Zhang,Jianqun Yang,Yonghui Yang,Xingji Li,Peijian Zhang
标识
DOI:10.1109/ted.2024.3403984
摘要
The impact of collector-to-emitter bias on the total ionizing dose (TID) response of high-voltage ( $\textit{BV}_{\textit{CEO}}$ $>$ 30 V) NPN bipolar junction transistors on thick-film silicon-on-insulator (SOI) technology is investigated using 10-keV X-rays. The radiation-induced base current increase in forward mode shows independence on collector bias condition during irradiation. However, the excess base current in the inverse mode is significantly suppressed under high collector-to-emitter bias condition in the irradiation procedure. TID irradiation-induced electric degradation behaviors and the corresponding 1/ f noise characteristics reveal that the previously irradiation created traps responsible for device degradation cannot be removed by the high collector voltage. The observed collector bias effect can be attributed to the field-assisted migration of holes captured by shallow oxide traps.
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