锐钛矿
材料科学
薄膜
光催化
阴极
化学工程
光降解
拉曼光谱
溅射沉积
带隙
纳米技术
光电子学
溅射
光学
催化作用
化学
有机化学
物理
物理化学
工程类
作者
Armstrong Godoy,A. L. J. Pereira,Barbara Souza Damasceno,Isabela Machado Horta,Marcilene Cristina Gomes,Douglas Marcel Gonçalves Leite,Walter Miyakawa,Maurício Ribeiro Baldan,M. Massi,Rodrigo Sávio Pessoa,Argemiro Soares da Silva Sobrinho
出处
期刊:Plasma
[MDPI AG]
日期:2023-06-01
卷期号:6 (2): 362-378
被引量:1
标识
DOI:10.3390/plasma6020025
摘要
In this study, we report the use of a radiofrequency plasma-assisted chemical vapor deposition (RF-CVD) system with a hollow cathode geometry to hydrogenate anatase TiO2 thin films. The goal was to create black TiO2 films with improved light absorption capabilities. The initial TiO2 was developed through magnetron sputtering, and this study specifically investigated the impact of hollow cathode hydrogen plasma (HCHP) treatment duration on the crucial characteristics of the resulting black TiO2 films. The HCHP treatment effectively created in-bandgap states in the TiO2 structure, leading to enhanced light absorption and improved conductivity. Morphological analysis showed a 24% surface area increase after 15 min of treatment. Wettability and surface energy results displayed nonlinear behavior, highlighting the influence of morphology on hydrophilicity improvement. The anatase TiO2 phase remained consistent, as confirmed by diffractograms. Raman analysis revealed structural alterations and induced lattice defects. Treated samples exhibited outstanding photodegradation performance, removing over 45% of methylene blue dye compared to ~25% by the pristine TiO2 film. The study emphasized the significant impact of 15-min hydrogenation on the HCHP treatment. The research provided valuable insights into the role of hydrogenation time using the HCHP treatment route on anatase TiO2 thin films and demonstrated the potential of the produced black TiO2 thin films for photocatalytic applications.
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