金属有机气相外延
光致发光
兴奋剂
激子
材料科学
光电子学
拉曼光谱
重组
接受者
氮化镓
分析化学(期刊)
自发辐射
化学
分子物理学
纳米技术
光学
凝聚态物理
物理
激光器
外延
图层(电子)
基因
生物化学
色谱法
作者
Sida Wei,Xiaodong Gao,Xiaodan Wang,Yangye Pan,Xionghui Zeng,Jiafan Chen,Shunan Zheng,Ke Xu
标识
DOI:10.1016/j.jlumin.2023.119740
摘要
Time-resolved photoluminescence measurements were performed to investigate the minority carrier recombination mechanism of p-GaN films grown on c-plane, m-plane and (10–11)-plane GaN freestanding substrates by MOCVD. The fast and slow decay lifetimes of the three samples were fitted by the bi-exponential function, in which the slow decay lifetime of the m-plane Mg-doped GaN reached a record long value of 493.7 ps? The effects of stress-induced non-radiative recombination centers and edge dislocations on the slow decay lifetime were ruled out using Raman and XRD. The reason for the longer slow decay lifetime of the m-plane sample is the reduction of the non-radiative recombination centers due to the decrease of the VGa concentration, ensuring by the magnitude of the IYL/INBE ratio in the PL spectra. The low-temperature PL spectra of the m-plane sample were investigated. According to Haynes' rule, the position of acceptor level was calibrated through combining with the position of the bound excitons at 5 K.
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