XRD and XPS studies of room temperature spontaneous interfacial reaction of CeO2thin films on Si and Si3N4substrates

X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) investigations of interfacial reactions between Ce and Si have been carried out on as-deposited and 15 month aged CeO₂/Si and CeO₂/Si₃N₄thin films.