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140 积分 2024-12-18 加入
High-aspect-ratio amorphous carbon mask etch profile control through plasma and surface chemistry optimization
1个月前
已完结
Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching
1个月前
已完结
Etching, Cutting, Drilling
2个月前
已关闭
Dopant-dependent Ion Assisted Etching Kinetics in Highly Doped Polysilicon Reactive Ion Etching
2个月前
已完结
Challenge of Boron-Doped Silicon Hard Mask Removal
2个月前
已完结
SiO2and Si3N4etch mechanisms in NF3/hydrocarbon plasma
2个月前
已完结
A Comprehensive Study of NF3-Based Selective Etching Processes: Application to the Fabrication of Vertically Stacked Horizontal Gate-All-around Si Nanosheet Transistors
2个月前
已完结
Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching
2个月前
已完结
Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study
2个月前
已完结
Contact local CD uniformity optimization through etch shrink
3个月前
已完结
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