Role of nanowire length on the performance of a self-driven NIR photodetector based on mono/bi-layer graphene (camphor)/Si-nanowire Schottky junction

材料科学 纳米线 石墨烯 光电子学 响应度 光电探测器 蚀刻(微加工) 比探测率 樟脑 肖特基势垒 平面的 图层(电子) 纳米技术 有机化学 计算机图形学(图像) 化学 二极管 计算机科学
作者
Harsh A. Chaliyawala,Neha Aggarwal,Zeel Purohit,Roma Patel,Govind Gupta,Alexandre Jaffré,Sylvain Le Gall,Abhijit Ray,Indrajit Mukhopadhyay
出处
期刊:Nanotechnology [IOP Publishing]
卷期号:31 (22): 225208-225208 被引量:13
标识
DOI:10.1088/1361-6528/ab767f
摘要

In this article, we have demonstrated a solid carbon source such as camphor as a natural precursor to synthesize a large area mono/bi-layer graphene (MLG) sheet to fabricate a nanowire junction-based near infrared photodetectors (NIRPDs). In order to increase the surface-to-volume ratio, we have developed Si-nanowire arrays (SiNWAs) of varying lengths by etching planar Si. Then, the camphor-based MLG/Si and MLG/SiNWAs Schottky junction photodetectors have been fabricated to achieve an efficient response with self-driven properties in the near infrared (NIR) regime. Due to a balance between light absorption capability and surface recombination centers, devices having SiNWAs obtained by etching for 30 min shows a better photoresponse, sensitivity and detectivity. Fabricated NIRPDs can also be functioned as self-driven devices which are highly responsive and very stable at low optical power signals up to 2 V with a fast rise and decay time of 34/13 ms. A tremendous enhancement has been witnessed from 36 μA W-1 to 22 mA W-1 in the responsivity at 0 V for MLG/30 min SiNWAs than planar MLG/Si PDs indicating an important development of self-driven NIRPDs based on camphor-based MLG for future optoelectronic devices.

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