跨导
材料科学
光电子学
钻石
电流密度
晶体管
工作职能
阈值电压
退火(玻璃)
场效应晶体管
逻辑门
电气工程
电压
图层(电子)
纳米技术
物理
复合材料
量子力学
工程类
作者
Yuesong Liang,Wei Wang,Tianlin Niu,Genqiang Chen,Fei Wang,Shi He,Minghui Zhang,Yanfeng Wang,Feng Wen,Hongxing Wang
摘要
A normally-off field effect transistor with 15 nm LaB6 gate material directly deposited on hydrogen-terminated diamond surface has been fabricated and characterized. The reason for the normally-off operation could be attributed to the low work function of LaB6 layer, which can deplete holes in the channel. Due to the formation of C–B bond of interface and the thin thickness of LaB6, the subthreshold swing is as low as 70.6 mV/dec and interface state density is as low as 2 × 1011 cm−2eV−1. The maximum drain current density (IDSmax), extrinsic transconductance (Gm), threshold voltage (VTH), and on/off ratio for the device with 8-μm gate length are −60 mA/mm, 5 mS/mm, −1.1 V, and 109, respectively. The low-field mobility (μ0) without vertical-field degradation is 187 cm2/V s. The trapped charge density and fixed charge density are 8.75 × 1011 and 1.26 × 1012 cm−2, respectively. The LaB6/H-diamond logic inverters coupling with different load resistors show distinct inversion characteristics with a peak gain of 4.7 V/V.
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