铁电性
高电子迁移率晶体管
电介质
材料科学
光电子学
晶体管
和大门
电压
电气工程
逻辑门
工程类
作者
Jeong Yong Yang,Seung‐Yoon Oh,Min Jae Yeom,Seokgi Kim,Gyuhyung Lee,Kyusang Lee,Sungkyu Kim,Geonwook Yoo
出处
期刊:IEEE Electron Device Letters
[Institute of Electrical and Electronics Engineers]
日期:2023-08-01
卷期号:44 (8): 1260-1263
被引量:2
标识
DOI:10.1109/led.2023.3287913
摘要
In this study, we demonstrate ferroelectric GaN high-electron mobility transistors (HEMTs) with a sputtered AlScN gate dielectric, exhibiting a large memory window of ~ 14.6 V and a high on/off ratio of $\sim ~10^{{8}}$ . The strong polarization of AlScN layer contributes to the remarkably large threshold voltage ( $\text{V}_{\text {th}}{)}$ tuning range with counterclockwise hysteresis depending on voltage sweep ranges and pulsed parameters. Moreover, a recessed-gate structure enables the pulsed enhancement and depletion mode switching. The reconfigurable Vth via pulse modulation further allows feasibility of NOR logic gate with the single ferroelectric GaN HEMT.
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