波导管
小型化
表面粗糙度
材料科学
传输损耗
光学
表面光洁度
硅
传输(电信)
散射
千分尺
光电子学
纳米
电介质
光子集成电路
光子学
纳米技术
物理
计算机科学
电信
复合材料
作者
Kevin C. Lee,Desmond R. Lim,Hsin-Chiao Luan,Anu Agarwal,James Foresi,Lionel C. Kimerling
摘要
In this letter, we experimentally evaluate the effect of miniaturization and surface roughness on transmission losses within a Si/SiO2 waveguide system, and explain the results using a theoretical model. Micrometer/nanometer-sized waveguides are imperative for its potential use in dense integrated optics and optical interconnection for silicon integrated circuits. A theoretical model was employed to predict the relationship between the transmission losses of the dielectric silicon waveguide and its width. This model accurately predicts that loss increases as waveguide width decreases. Furthermore, we show that a major source of loss comes from sidewall roughness. We have constructed a complete contour map showing the interdependence of sidewall roughness and transmission loss, to assist users in their design of an optimal waveguide fabrication process that minimizes loss. Additionally, users can find an effective path to reduce the scattering loss from sidewall roughness. Using this map, we confirm that nanometer-size silicon waveguides with 0.1 dB/cm transmission loss are possible with the currently available technology.
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