通过硅通孔
钥匙(锁)
制作
缩放比例
三维集成电路
表征(材料科学)
硅
集成电路
电子工程
材料科学
光学(聚焦)
计算机科学
计算机体系结构
工程物理
工程类
纳米技术
光电子学
医学
光学
物理
病理
替代医学
计算机安全
数学
几何学
作者
Paragkumar A. Thadesar,Xiaoxiong Gu,Ramakanth Alapati,Muhannad S. Bakir
出处
期刊:IEEE Transactions on Components, Packaging and Manufacturing Technology
[Institute of Electrical and Electronics Engineers]
日期:2016-03-08
卷期号:6 (7): 1007-1017
被引量:42
标识
DOI:10.1109/tcpmt.2016.2524691
摘要
To address the abating performance improvements from device scaling, innovative 2.5-D and 3-D integrated circuits with vertical interconnects called through-silicon vias (TSVs) have been widely explored. This paper reviews TSVs with focus on the following: 1) key drivers for TSV-based integration; 2) TSV fabrication techniques; 3) TSV electrical and thermomechanical performance fundamentals and characterization techniques; and 4) novel technologies to attain enhanced performance beyond the state-of-the-art TSVs.
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