材料科学
电阻随机存取存储器
记忆电阻器
纳米电子学
氮化硼
电介质
光电子学
电阻式触摸屏
神经形态工程学
绝缘体(电)
导电体
阈值电压
六方氮化硼
电子线路
纳米技术
复合材料
电压
电气工程
晶体管
工程类
机器学习
人工神经网络
计算机科学
石墨烯
作者
Mario Lanza,Félix Palumbo,Yuanyuan Shi,Fernando Aguirre,Santiago Boyeras,Bin Yuan,Eilam Yalon,E. Moreno,Tianru Wu,J.B. Roldán
标识
DOI:10.1002/aelm.202100580
摘要
Abstract Two‐terminal metal/insulator/metal (MIM) memristors exhibiting threshold resistive switching (RS) can develop advanced key tasks in solid‐state nano/micro‐electronic circuits, such as selectors and integrate‐and‐fire electronic neurons. MIM‐like memristors using multilayer hexagonal boron nitride (h‐BN) as dielectric are especially interesting because they have shown threshold RS with ultra‐low energy consumption per state transition down to the zeptojoule regime. However, the factors enabling stable threshold RS at such low operation energies are still not fully understood. Here it is shown that the threshold RS in 150 nm × 150 nm Au/Ag/h‐BN/Au memristors is especially stable because the temperature in the h‐BN stack during operation (i.e., at low currents ≈1 μA) is very low (i.e., ≈310 K), due to the high in‐plane thermal conductivity of h‐BN and its low thickness. Only when the device is operated at higher currents (i.e., ≈200 μA) the temperatures at the h‐BN increase remarkably (i.e., >500 K), which produce a stable non‐volatile conductive nanofilament (CNF). This work can bring new insights to understand the performance of 2D materials based RS devices, and help to develop the integration of 2D materials in high‐density nanoelectronics.
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