材料科学
沉积(地质)
微晶
图层(电子)
锌
薄膜
镓
溅射
铟
电极
原子层沉积
选择性
溅射沉积
分析化学(期刊)
光电子学
纳米技术
化学
催化作用
冶金
环境化学
物理化学
生物化学
古生物学
沉积物
生物
作者
Sunil Babu Eadi,Han Yan,P. Senthil Kumar,R. Yuvakkumar,Hi‐Deok Lee
标识
DOI:10.1016/j.envres.2022.113796
摘要
In this study, indium–gallium–zinc oxide (IGZO)-decorated ZnO thin films were investigated through the change in IGZO deposition time for the detection of NO2 gas. The atomic layer deposited ZnO on interdigitated Au electrode alumina substrates are decorated with IGZO by controlling the deposition time. The IGZO (ZnO:Ga2O3:In2O3 = 1:1:1 mol. %) polycrystalline target was used for deposition and effect of deposition time was investigated. The sensor responses (Rgas/Rair) of 20.6, 39.3, and 57.1 and 45.2, 102.5, and 243.5 were obtained at 150 °C, 200 °C, and 250 °C and 25-ppm NO2 concentration for ZnO (Z1) and IGZO-decorated ZnO (Z3) films, respectively. The sensor response (Rgas/Rair) increased from ∼27 to 243.5 by decorating the ZnO film with IGZO for a 60-s sputtering time. The sensor recovery and response times of the IGZO-decorated ZnO/ZnO sensor increased, and the sensor selectivity to different gases was also evaluated.
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