开尔文探针力显微镜
伏打电位
显微镜
工作职能
扫描探针显微镜
纳米技术
化学
光电发射电子显微术
光电子学
光学
材料科学
物理
电子显微镜
图层(电子)
作者
Wilhelm Melitz,Jian Shen,Andrew C. Kummel,Sangyeob Lee
标识
DOI:10.1016/j.surfrep.2010.10.001
摘要
Kelvin probe force microscopy (KPFM) is a tool that enables nanometer-scale imaging of the surface potential on a broad range of materials. KPFM measurements require an understanding of both the details of the instruments and the physics of the measurements to obtain optimal results. The first part of this review will introduce the principles of KPFM and compare KPFM to other surface work function and potential measurement tools, including the Kelvin probe (KP), photoemission spectroscopy (PES), and scanning electron microscopy (SEM) with an electron beam induced current (EBIC) measurement system. The concept of local contact potential difference (LCPD), important for understanding atomic resolution KPFM, is discussed. The second part of this review explores three applications of KPFM: metallic nanostructures, semiconductor materials, and electrical devices.
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