碳化硅
电子工程
端口(电路理论)
散射参数
寄生提取
功率(物理)
MOSFET
电气工程
功率MOSFET
电阻抗
工程类
拓扑(电路)
计算机科学
材料科学
电压
物理
晶体管
冶金
量子力学
作者
Tianjiao Liu,Thomas Wong,Z. John Shen
出处
期刊:IEEE Transactions on Power Electronics
[Institute of Electrical and Electronics Engineers]
日期:2018-01-09
卷期号:33 (11): 9819-9833
被引量:84
标识
DOI:10.1109/tpel.2017.2789240
摘要
The parasitic inductances of silicon carbide (SiC) power mosfets have a major influence on their operation and circuit performance. They incur negative effects such as switching oscillations, power losses, and electromagnetic interference noise. This paper introduces a new technique to accurately characterize the parasitic inductances of SiC power mosfets in both discrete packages and power modules based on two-port S-parameters measurement. By treating a power mosfet as a two-port network, we obtain the scattering (S) and impedance (Z) parameters from network analyzer measurement. These parameters, through detailed network analysis, provide more accurate values of the internal parasitic inductances than the commonly used single-port impedance measurement technique. The new approach is first verified with high-frequency circuit simulation and then applied in the case study of SiC power mosfets in a TO-247 discrete package and a half-bridge power module. In addition, a number of silicon power mosfets and IGBTs in TO-247, TO-220, D 2 PAK, DPAK, and SO-8 packages are also characterized for comparison. A comparison between the characterization results from the new two-port and the prior art one-port methods reveals a significant difference ranging from 12.6% to 93.9%.
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