材料科学
三氯氢硅
纳米结构
硅
接触角
蚀刻(微加工)
图层(电子)
各向同性腐蚀
干法蚀刻
基质(水族馆)
纳米技术
纳米光刻
二氧化硅
复合材料
光电子学
制作
海洋学
地质学
病理
医学
替代医学
作者
Amarendra Kumar,Kunal Kashyap,Kai Liao,Max T. Hou,J. Andrew Yeh
标识
DOI:10.1109/nems.2014.6908771
摘要
Glass nanostructures were fabricated by wet chemical etching instead of using the complicated nanolithography and expensive dry etching process. Super hydrophilic glass with contact angle of 1° was created using this nanostructure with 92% transparency. Self-assembled monolayer of Perfluorodecyl-trichlorosilane (FDTS) was used to further make the glass super hydrophobic with contact angle of 151° without affecting its transparency. Polysilicon layer of 300 nm was deposited on glass substrate first and nanostructures were fabricated in this layer by metal assisted wet chemical etching. Thermal oxidation converted the silicon nanostructure to silicon dioxide nanostructure. This technology is producible on mass scale and useful in preparation of anti-fogging and self-cleaning glass.
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