聚酰亚胺
玻璃化转变
高分子化学
延伸率
材料科学
化学
降冰片烯
化学工程
聚合物
复合材料
图层(电子)
极限抗拉强度
聚合
工程类
作者
Shiyong Yang,C.E Park,Mi‐Hee Jung
出处
期刊:Polymer
[Elsevier]
日期:2003-05-01
卷期号:44 (11): 3243-3249
被引量:18
标识
DOI:10.1016/s0032-3861(03)00273-8
摘要
Photosensitive polyimide (PSPI) was synthesized and characterized to replace the conventional polyimide buffer layer because direct patterning with PSPI could reduce the processing procedure to the half. Since PSPI should be dissolved in alkaline aqueous solution and have good mechanical properties after imidization, low molecular weight of PSPI was synthesized with reactive end-capper, which could extend the chain length of PSPI during imidization. Therefore norbornene end-capped PSPI precursor was synthesized with various 5-norbornene-2,3-dicarboxylic anhydride (NDA) content. Although molecular weight of PSPI decrease with increasing NDA content, the elongation at break and the glass transition temperature (Tg) of PSPI films imidized at 300 °C increased with increasing NDA content. On the other hand, elongation at break of PSPI films imidized at 350 °C decreased but Tg of those increased with increasing NDA content. Above Tg, thermal expansion coefficient decreased dramatically by introducing NDA end-capper. From mechanical and thermal properties of PSPI, it appears that low molecular weight of PSPI can be chain-extended and crosslinked during imidization.
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