材料科学
纳米压印光刻
模具
平版印刷术
纳米光刻
抵抗
软光刻
复合材料
纳米技术
下一代光刻
毛细管作用
制作
聚二甲基硅氧烷
基质(水族馆)
光电子学
造型(装饰)
作者
N. Chaix,Stefan Landis,D. Hermelin,Tanguy Leveder,Corinne Perret,V. Delaye,Cécile Gourgon
出处
期刊:Journal of Vacuum Science & Technology B
日期:2006-11-30
卷期号:24 (6): 3011-3015
被引量:6
摘要
Nanoimprint lithography (NIL) processes are often plagued by different kinds of defects. The so-called capillary bridge is related to capillary forces between the stamp surface and the polymer during the pressing process. These defects affect both the printed and unprinted areas of the polymer film. Implementation of NIL as an industrial process requires that these defects be understood and minimized. As such, establishing a relationship between capillary bridge growing and pressing conditions, specifically the mold to polymer distance, is a key step. Two NIL stamps with various feature depths (12–224nm) were studied in this work to establish a link between bridge formation and mold filling. Printing processes were performed using small forces to guarantee contact between the mold and resist without totally filling stamp cavities. The resulting capillary bridges were characterized as a function of cavity depth and printing temperature. Results indicate that the number of defects is strongly influenced by ...
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