Effects of diazonaphthoquinone groups on photosensitive coating

Abstract Diazonaphthoquinone (DNQ)‐novolak photosensitive materials are important in lithography. DNQ groups play an important role in the photosensitive coating. However, there are no reports on the relationship between content of DNQ groups and properties of the coating. The properties include alkali resistance, isopropanol resistance, and abrasion resistance, the key factors in lithography. The experimental results show proper content of DNQ groups can ensure higher sensitivity, finer resolution, and better abrasion resistance in lithography. © 2010 Wiley Periodicals, Inc. J Appl Polym Sci, 2010