材料科学
光电子学
钝化
硅
基质(水族馆)
表面改性
硅烷
纳米技术
作者
Jianhui Chen,Kunpeng Ge,Cuili Zhang,Jianxin Guo,Linlin Yang,Dengyuan Song,Feng Li,Zhuo Xu,Ying Xu,Yaohua Mai
标识
DOI:10.1021/acsami.8b17379
摘要
Crystalline silicon (c-Si) solar cells remain dominant in the photovoltaic (PV) market because of their cost-effective advantages. However, the requirement for expensive vacuum equipment and the power-hungry thermal budget for surface passivation technology, which is one of the key enablers of the high performance of c-Si solar cells, impede further reductions of costs. Thus, the omission of the vacuum and high-temperature process without compromising the passivation effect is highly desirable due to cost concerns. Here, we demonstrate a vacuum-free, room-temperature organic Nafion thin-film passivation scheme with an effective minority carrier lifetime (τeff) exceeding 9 ms on an n-type c-Si wafer with a resistivity of 1–5 Ω·cm, corresponding to an implied open circuit voltage (iVoc) of 724 mV and upper-limit surface recombination velocity (SRV) of 1.46 cm/s, which is a level that is in line with the hydrogenated amorphous Si film-passivation scheme used in the current PV industry. We find that the Nafio...
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