化学气相沉积
外延
材料科学
单层
薄脆饼
表征(材料科学)
纳米技术
六方氮化硼
石墨烯
图层(电子)
作者
Ji Hoon Park,Ang‐Yu Lu,Mohammad Mahdi Tavakoli,Na Yeon Kim,Ming‐Hui Chiu,Hongwei Liu,Tianyi Zhang,Zhien Wang,Jiangtao Wang,Luiz G. P. Martins,Zhengtang Luo,Miaofang Chi,Jianwei Miao,Jing Kong
出处
期刊:Nano Letters
[American Chemical Society]
日期:2023-05-17
卷期号:23 (11): 4741-4748
被引量:6
标识
DOI:10.1021/acs.nanolett.2c04624
摘要
Wafer-scale monolayer two-dimensional (2D) materials have been realized by epitaxial chemical vapor deposition (CVD) in recent years. To scale up the synthesis of 2D materials, a systematic analysis of how the growth dynamics depend on the growth parameters is essential to unravel its mechanisms. However, the studies of CVD-grown 2D materials mostly adopted the control variate method and considered each parameter as an independent variable, which is not comprehensive for 2D materials growth optimization. Herein, we synthesized a representative 2D material, monolayer hexagonal boron nitride (hBN), on single-crystalline Cu (111) by epitaxial chemical vapor deposition and varied the growth parameters to regulate the hBN domain sizes. Furthermore, we explored the correlation between two growth parameters and provided the growth windows for large flake sizes by the Gaussian process. This new analysis approach based on machine learning provides a more comprehensive understanding of the growth mechanism for 2D materials.
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