JFET公司
错配
MESFET
场效应晶体管
材料科学
晶体管
光电子学
半导体
电气工程
电压
工程类
作者
Fabian J. Klüpfel,Friedrich‐Leonhard Schein,Michael Lorenz,Heiko Frenzel,Holger von Wenckstern,Marius Grundmann
标识
DOI:10.1109/ted.2013.2257173
摘要
We compare key properties of zinc oxide (ZnO)-based junction field-effect transistors (JFETs), metal-semiconductor field-effect transistors (MESFETs), and metal-insulator-semiconductor field-effect transistors (MISFETs) prepared from a common ZnO:Mg thin film. The JFETs are fabricated with a ZnCo 2 O 4 -gate, the MESFETs with reactively sputtered Pt-gate and the MISFETs with WO 3 as gate insulator. The three FET types are compared with regarding dc characteristics, frequency dependence, and stability at temperatures up to 150°C. All devices can be switched within a similar gate voltage range of less than 3 V, making a direct comparison of the device characteristics possible. Measurements above room temperature show a common shift of the transfer curves to higher gate voltages, which seems to be a distinguishing property of ZnO compared with other semiconductors. All electric measurements show major differences between the devices, which can be attributed to the different gate structures.
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