期刊:Journal of Semiconductors [IOP Publishing] 日期:2016-09-01卷期号:37 (9): 094003-094003被引量:9
标识
DOI:10.1088/1674-4926/37/9/094003
摘要
In order to improve the drive current and subthreshold swing (SS), a novel vertical-dual-source tunneling field-effect transistor (VDSTFET) device is proposed in this paper. The influence of source height, channel length and channel thickness on the device are investigated through two-dimensional numerical simulations. Si-VDSTFET have greater tunneling area and thinner channel, showing an on-current as high as 1.24 μA at gate voltage of 0.8 V and drain voltage of 0.5 V, off-current of less than 0.1 fA, an improved average subthreshold swing of 14 mV/dec, and a minimum point slope of 4 mV/dec.