Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Double-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light. The model is accurate and can be used in the study of double-Ronchi shearing interferometry.