材料科学
化学机械平面化
结晶
纳米颗粒
纳米技术
化学工程
薄脆饼
抛光
硅
纳米
刻面
溶解
氧化物
Crystal(编程语言)
冶金
复合材料
结晶学
化学
程序设计语言
工程类
计算机科学
作者
Xiangdong Feng,Dean C. Sayle,Zhong Lin Wang,M. Sharon Paras,Brian Santora,Anthony C. Sutorik,Thi X. T. Sayle,Yi Yang,Yong Ding,Xudong Wang,Yie-Shein Her
出处
期刊:Science
[American Association for the Advancement of Science]
日期:2006-06-09
卷期号:312 (5779): 1504-1508
被引量:590
标识
DOI:10.1126/science.1125767
摘要
Ceria nanoparticles are one of the key abrasive materials for chemical-mechanical planarization of advanced integrated circuits. However, ceria nanoparticles synthesized by existing techniques are irregularly faceted, and they scratch the silicon wafers and increase defect concentrations. We developed an approach for large-scale synthesis of single-crystal ceria nanospheres that can reduce the polishing defects by 80% and increase the silica removal rate by 50%, facilitating precise and reliable mass-manufacturing of chips for nanoelectronics. We doped the ceria system with titanium, using flame temperatures that facilitate crystallization of the ceria yet retain the titania in a molten state. In conjunction with molecular dynamics simulation, we show that under these conditions, the inner ceria core evolves in a single-crystal spherical shape without faceting, because throughout the crystallization it is completely encapsulated by a molten 1- to 2-nanometer shell of titania that, in liquid state, minimizes the surface energy. The principle demonstrated here could be applied to other oxide systems.
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