蒸发
薄膜
材料科学
化学工程
离子
矿物学
分析化学(期刊)
纳米技术
化学
环境化学
热力学
物理
有机化学
工程类
标识
DOI:10.1016/0040-6090(91)90007-k
摘要
Abstract Al 2 O 3 films were produced by bombardment with oxygen ions during evaporation in a conventional electron beam evaporation system. Contrary to films produced without ion bombardment but otherwise identical parameters, these Al 2 O 3 films exhibited considerably improved dielectric properties. The improvements can be explained by a significantly increased homogeneity and a raised density of the Al 2 O 3 films.
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