材料科学
薄膜晶体管
晶体管
光电子学
半导体
铟
图层(电子)
铜
数码产品
溶解过程
薄膜
柔性电子器件
纳米技术
电压
电气工程
冶金
工程类
作者
Ao Liu,Huihui Zhu,Won‐Tae Park,Seok‐Ju Kang,Yong Xu,Myung‐Gil Kim,Yong‐Young Noh
标识
DOI:10.1002/adma.201802379
摘要
Abstract Here, room‐temperature solution‐processed inorganic p‐type copper iodide (CuI) thin‐film transistors (TFTs) are reported for the first time. The spin‐coated 5 nm thick CuI film has average hole mobility ( µ FE ) of 0.44 cm 2 V −1 s −1 and on/off current ratio of 5 × 10 2 . Furthermore, µ FE increases to 1.93 cm 2 V −1 s −1 and operating voltage significantly reduces from 60 to 5 V by using a high permittivity ZrO 2 dielectric layer replacing traditional SiO 2 . Transparent complementary inverters composed of p‐type CuI and n‐type indium gallium zinc oxide TFTs are demonstrated with clear inverting characteristics and voltage gain over 4. These outcomes provide effective approaches for solution‐processed inorganic p‐type semiconductor inks and related electronics.
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