硅
扩散
有效扩散系数
材料科学
大气温度范围
航程(航空)
分析化学(期刊)
化学
冶金
热力学
复合材料
物理
色谱法
医学
放射科
磁共振成像
作者
Takashi Isobe,Hiroshi Nakashima,Kimio Hashimoto
摘要
The in-depth profiles of iron in silicon diffused with iron at 800, 900, 1000 and 1070°C were investigated by DLTS measurements. The diffusion coefficient of interstitial iron in silicon was represented by the expression D Fe =9.5×10 -4 exp (-0.65/ k T ) cm 2 s -1 in the temperature range of 800–1070°C.
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