Making waves: Opportunities and challenges of applying far-UVC radiation in controlling micropollutants in water

化学 环境化学 水处理 紫外线 废水 光解 溴化物 光化学 硝酸盐 光催化 水质 环境科学 环境工程 无机化学 催化作用 光电子学 有机化学 材料科学 生物 生态学
作者
Jianye Zhao,Emma Payne,Bryan Liu,Chii Shang,Ernest R. Blatchley,William A. Mitch,Ran Yin
出处
期刊:Water Research [Elsevier]
卷期号:241: 120169-120169 被引量:2
标识
DOI:10.1016/j.watres.2023.120169
摘要

Concerns over human health risks associated with chemical contaminants (micropollutants) in drinking waters are rising due to the increased use of reclaimed water or water supplies impacted by upstream wastewater discharges. Ultraviolet (UV)-driven advanced oxidation processes (UV-AOPs) using radiation sources that emit at 254 nm have been developed as advanced treatments to degrade contaminants, while those UV-AOPs can be improved towards higher radical yields and lower byproduct formation. Several previous studies have suggested that Far-UVC radiation (200-230 nm) is a promising radiance source to drive UV-AOPs because the direct photolysis of micropollutants and production of reactive species from oxidant precursors can both be improved. In this study, we summarize from the literature the photodecay rate constants of five micropollutants by direct UV photolysis, which are higher at 222 than 254 nm. We experimentally determine the molar absorption coefficients at 222 and 254 nm of eight oxidants commonly used in water treatment and present the quantum yields of the oxidant photodecay. Our experimental results also show that the concentrations of HO·, Cl·, and ClO· generated in the UV/chlorine AOP can be increased by 5.15-, 15.76-, and 2.86-fold, respectively, by switching the UV wavelength from 254 to 222 nm. We also point out the challenges of applying Far-UVC for micropollutant abatement in water treatment, including the strong light screening effect of matrix components (e.g., carbonate, nitrate, bromide, and dissolved organic matter), the formation of byproducts via new reaction pathways, and the needs to improve the energy efficiency of the Far-UVC radiation sources.
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