平版印刷术
无光罩微影
光学
材料科学
X射线光刻
斜格
光掩模
制作
计算光刻
光刻
下一代光刻
投影(关系代数)
抵抗
电子束光刻
计算机科学
物理
纳米技术
图层(电子)
医学
替代医学
算法
语言学
病理
哲学
作者
Long Huang,Chunxia Liu,Han Zhang,Shaoqing Zhao,Mingyue Tan,Minzhe Liu,Zhongqing Jia,Ruizhan Zhai,Hua Liu
标识
DOI:10.1016/j.optlastec.2022.108666
摘要
This paper proposes a static oblique lithography (SOL) strategy based on conventional digital micromirror device (DMD) projection lithography. This strategy combines the oblique lithography on oblique scanning lithography with static lithography to ensure that we can produce high fidelity microstructures with very smooth curved edges in all directions and more accurate relative line positions. Not only does the single-axis high-precision micromotion stage of this strategy enable a significant reduction in fabrication cost, but also enables the lithography of subpixel-width curves with smooth edges used our improved sub-pattern quantization strategy. The intensity distribution of the actual diffracted light field at the focal point of the helical zone plate fabricated by the SOL is highly matched with the intensity distribution of the designed simulated light field. This shows that the SOL can play an important role in the field of micro-optical device fabrication.
科研通智能强力驱动
Strongly Powered by AbleSci AI