单层
跨导
材料科学
电介质
晶体管
光电子学
场效应晶体管
热导率
电导率
纳米技术
电气工程
化学
电压
复合材料
工程类
物理化学
作者
Xinhang Shi,Xuefei Li,Qi Guo,Han Gao,Min Zeng,Yibo Han,Shiwei Yan,Yanqing Wu
出处
期刊:Nano Letters
[American Chemical Society]
日期:2022-09-09
卷期号:22 (18): 7667-7673
被引量:9
标识
DOI:10.1021/acs.nanolett.2c02901
摘要
Two-dimensional semiconducting transition metal dichalcogenides (TMDs) enable ultimate channel length scaling of transistor technology due to their atomic-thin body nature, which also brings the challenge of a pronounced self-heating effect inside the ultrathin channel. In particular, high current density under high electric field could lead to negative differential resistance behavior due to self-heating, not only limiting the current carrying capability of the TMDs transistors but also leading to severe reliability issues. Here, we report high-performance monolayer WS2 transistors on a high-thermal-conductivity BeO dielectric with effective suppression of the self-heating effects, eliminating the negative differential resistance behavior at high field, as observed in the case of the HfO2 dielectric. The monolayer CVD WS2 device on BeO with a 50 nm channel length exhibits a record-high on-state current of 325 μA/μm, transconductance (gm) of 150 μS/μm, and a on/off ratio of 1.8 × 108 at Vds = 1 V, far exceeding previous results.
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