电感器
等离子体
电感
电阻抗
电容
容性耦合等离子体
电极
电压
化学
共振(粒子物理)
材料科学
等离子体参数
光电子学
感应耦合等离子体
原子物理学
电气工程
物理
工程类
物理化学
量子力学
作者
Yeong Phang Lim,You Jian He,Jaewon Lee,Juho Kim,Kyung Hwan Kim,Chin-Wook Chung
标识
DOI:10.1088/1361-6595/ac56c4
摘要
Abstract Plasma generation efficiency in a capacitively coupled plasma (CCP) at high densities or high conductivity tends to be lower due to low plasma resistance. An inductor is installed to a powered electrode in parallel to improve plasma generation efficiency at higher density in the CCP. To reduce the power loss in a system, a parallel resonance is used between the capacitance of the CCP and the inductance of the parallel inductor. When parallel resonance occurs, the impedance of the chamber, including the plasma, increases. Therefore, the current flowing in the system is expected to decrease. At the resonance, the current in the system significantly decreases, and the voltages and currents at the powered electrode significantly increase. This phenomenon indicates that the system power loss is decreased, and the power absorbed by the plasma is increased. As a result, the ion density and the voltage at the powered electrode are increased up to 66% and 25% at the parallel resonance condition, respectively. To understand these increases, a circuit model for the plasma and the parallel inductor is suggested which shows good agreement with the experimental results. This method can be applied to the CCP for improving plasma generation.
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