薄膜
高温超导
脉冲激光沉积
超导电性
材料科学
溅射
制作
沉积(地质)
化学计量学
激光烧蚀
化学气相沉积
约瑟夫森效应
晶界
碳膜
溅射沉积
纳米技术
化学工程
凝聚态物理
微观结构
化学
复合材料
激光器
光学
物理化学
物理
替代医学
沉积物
古生物学
病理
工程类
生物
医学
作者
P. Kuppusami,V.S. Raghunathan
标识
DOI:10.1179/095066003225010191
摘要
AbstractAbstractRemarkable advances have been made in recent years in the science and technology of thin film processes for deposition of high critical temperature T c superconductors. However, the fabrication of thin films of high T c materials, especially YBa2Cu3O7-x, for superconducting applications is associated with problems in areas such as chemical and structural purity, stability, oxygen stoichiometry, and weak links. As a consequence, many deposition techniques have been applied to grow thin films. In this review, the critical processing parameters in the deposition of YBa2Cu3O7-x films by techniques such as sputtering, laser ablation, and metalorganic chemical vapour deposition are discussed. Another important aim is to examine the influence of microstructural features on the transport properties of these films. Finally, an application of thin films of YBa2Cu3O7-x is illustrated from the results available on controlled growth of a grain boundary Josephson junction.
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